姓名：伍晓锋

学历：理学博士

职称：副教授

研究方向：半导体光（电）催化

电子邮箱：xiaofengwu0501@163.com  xiaofengwu0501@whpu.edu.cn

（一）教育和工作经历

2024.11-今: 武汉轻工大学化学与环境工程学院讲师

2020.10-2024.08：（德国）达姆施塔特工业大学材料与地球科学系（Department of Materials and Earth Sciences, Technical University of Darmstadt）材料化学专业博士研究生（导师：Jan Philipp Hofmann 教授）

2017.10-2020.10：（荷兰）埃因霍芬理工大学化学工程与化学系（Department of Chemical Engineering and Chemistry, Eindhoven University of Technology）材料化学专业博士研究生（导师：Emiel Hensen教授和Jan Philipp Hofmann 教授）

2014.09-2017.06: 中南民族大学化学与材料科学学院无机化学专业硕士研究生（导师：吕康乐 教授）

2011.09-2014.08：苏州太湖电工新材料有限公司技术员

2007.09-2011.06：武汉工程大学化工与制药学院应用化学专业本科生

（二）教学课程

实验设计与数据处理（研究生）

（三）科研项目

1.过渡金属氧化物 (光)电催化水分解电化学界面和载流子动力学研究（2021.01-2023.12），中德科学中心合作交流项目，参与

2.基于晶面接触效应构建高效半导体复合光催化材料（2017-2020），国家自然科学基金面上项目，参与

3.高效环境功能材料的结构调控与性能研究（2017.01-2017.12），基本科研业务费专项资金项目，参与

4.基于TiO₂与石墨烯复合的晶面接触效应构建高效染料敏化太阳能电池（2016 -2018），武汉市科技计划项目（应用基础研究），参与

（四）发表论文

1. Zheng Qi^#, Xiaofeng Wu^#, Qin Li, Chunshan Lu*, Sónia A.C. Carabineiro*, Zaiwang Zhao*, Yi Liu, Kangle Lv*, Singlet Oxygen in Environmental Catalysis: Mechanisms, Applications and Future Directions, Coordin. Chem. Rev. 2025, 529, 216439.

2. Xiaofeng Wu*, Freddy E. Oropeza, Shixin Chang, Marcus Einert, Qingyang Wu, Clément Maheu, Julia Gallenberger, Chuanmu Tian, Kangle Lv, Jan P. Hofmann*, Promoting effect of interfacial hole accumulation on photoelectrochemical water oxidation in BiVO₄ and Mo doped BiVO₄, Adv. Powder Mater. 2024, 3(7), 100234.

3. Mengxue Yu, Shixin Chang, Liang Ma, Xiaofeng Wu*, Juntao Yan, Yaobin Ding, Xue Zhang, Sónia A.C. Carabineiro, Kangle Lv*, Remarkable improvement in photocatalytic activity of g-C₃N₄ for NO oxidation through surface hydroxylation, Sep. Purif. Technol., 2025, 354, 128695

4. Xiaofeng Wu, Ningxin Kang, Xiaofang Li, Zhihua Xu, Sónia A.C. Carabineiro, Juntao Yan, Yi Liu, Kangle Lv^*, 2D/2D layered BiOIO₃/g-C₃N₄ S-scheme heterojunction for photocatalytic NO oxidation, J Mater. Sci. Technol., 2024, 196, 40-49.

5. Xiaofeng Wu, Jie Zhou, Qiuyan Tan, Kaining Li, Qin Li, Sónia A. Correia Carabineiro, and Kangle Lv^*, Remarkable Enhancement of Photocatalytic Activity of High-Energy TiO₂ Nanocrystals for NO Oxidation through Surface Defluorination, ACS Appl. Mater. Interfaces, 2024, 16(9), 11479-11488.

6. Xiaofeng Wu, Freddy E. Oropeza, Zheng Qi, Marcus Einert, Chuanmu Tian, Clement Maheu, Kangle Lv and Jan P. Hofmann^*, Influence of Mo doping on interfacial charge carrier dynamics in photoelectrochemical water oxidation on BiVO₄, Sustain. Energy & Fuels, 2023, 7, 2923-2933.

7. Xiaofeng Wu, Freddy E. Oropeza, Daan den Boer, Peter Kleinschmidt, Thomas Hannappel, Dennis G. H. Hetterscheid, Emiel J. M. Hensen, Jan Philipp Hofmann^*, Thermally induced oxygen vacancies in BiOCl nanosheets and their impact on photoelectrochemical performance, ChemPhotoChem, 2023, 7, e202200192

8. Ruina Li, Xiaoyu Ou, Li Zhang, Zheng Qi, Xiaofeng Wu^*, Chunshan Lu^*, Jiajie Fan, Kangle Lv^*, Photocatalytic oxidation of NO on reduction type semiconductor photocatalysts: effect of metallic Bi on CdS nanorods, Chem. Commun. 2021, 57, 10067-10070.

9. Kaining Li, Sushu Zhang, Qiuyan Tan, Xiaofeng Wu^*, Yuhan Li^*, Qin Li, Jiajie Fan, Kangle Lv^*, Insulator in photocatalysis: Essential roles and activation strategies, Chem. Eng. J. 2021, 426, 130772.

10. Xiaofeng Wu, Jinshui Cheng, Xiaofang Li^*, Yuhan Li, Kangle Lv^*, Enhanced visible photocatalytic oxidation of NO by repeated calcination of g-C₃N₄, Appl. Surf. Sci. 2019, 465, 1037-1046.

11. Xiaofeng Wu, Lili Wen, Kangle Lv^*, Kejian Deng, Dingguo Tang, Hengpeng Ye, Dongyun Du, Sining Liu, Mei Li^*, Fabrication of ZnO/graphene flake-like photocatalyst with enhanced photoreactivity. Appl. Surf. Sci. 2015, 358, 130-136.

12. Xiaofeng Wu, Shun Fang, Yang Zheng, Jie Sun, Kangle Lv^*, Thiourea-modified TiO₂ nanorods with enhanced photocatalytic activity. Molecules 2016, 21, 181.

（五）授权专利

1. 吕康乐，伍晓锋，李玫，李覃，邓克俭，朱君江，黄涛，凝聚层体系在污染物选择性光催化降解中的应用，授权日期：2016年8月24日，专利号：ZL201510147918.3

2. 吕康乐，程金水，方顺，伍晓锋，李玫，李覃，丁耀彬，杨昌军，唐和清，一种高可见光活性石墨相氮化碳纳米片及其制备方法，申请日期：2018.06.27，专利授权日期：2021.05.11，专利号：ZL201810674429.7

3. 吕康乐，程金水，方顺，伍晓锋，李玫，李覃，杨昌军，唐和清，一种高可见光活性石墨相氮化碳及其应用，授权日期：2019年8月22日，专利号：ZL201710267741.X